High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing
High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing Detail:
1. Equipment application
This equipment is mainly used for metal or metal alloy melting in vacuum and then atomization in atomization chamber under the gas protection environment to produce metal powder or metal granule.
The vacuum type gas atomization equipment is used for production the metal powder with high control requirement of oxygen content increment, at the same time, it own all powder production functions of antivacuum gas atomization equipments.
2. Equipment capacity
30KG-1000KG/batch for choose.
3. Equipment cover area
Length*Width*Height: 6M*7M*7-12M.
Product detail pictures:
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Good quality comes to start with; service is foremost; organization is cooperation" is our enterprise philosophy which is regularly observed and pursued by our firm for High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing , The product will supply to all over the world, such as: Bolivia , Germany , United States , We always insist on the management tenet of "Quality is First, Technology is Basis, Honesty and Innovation".We are able to develop new products continuously to a higher level to satisfy different needs of customers.
The goods we received and the sample sales staff display to us have the same quality, it is really a creditable manufacturer.
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