High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing
High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing Detail:
1. Equipment application
This equipment is mainly used for metal or metal alloy melting in vacuum and then atomization in atomization chamber under the gas protection environment to produce metal powder or metal granule.
The vacuum type gas atomization equipment is used for production the metal powder with high control requirement of oxygen content increment, at the same time, it own all powder production functions of antivacuum gas atomization equipments.
2. Equipment capacity
30KG-1000KG/batch for choose.
3. Equipment cover area
Length*Width*Height: 6M*7M*7-12M.
Product detail pictures:
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We stick to our enterprise spirit of "Quality, Efficiency, Innovation and Integrity". We aim to create more value for our customers with our rich resources, advanced machinery, experienced workers and excellent services for High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing , The product will supply to all over the world, such as: Switzerland , Islamabad , USA , We are your reliable partner in the international markets of our products. We focus on providing service for our clients as a key element in strengthening our long-term relationships. The continual availability of high grade products in combination with our excellent pre- and after-sales service ensures strong competitiveness in an increasingly globalized market. We are willing to cooperate with business friends from at home and abroad, to create a great future. Welcome to Visit our factory. Looking forward to have win-win cooperation with you.
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