High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing
High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing Detail:
1. Equipment application
This equipment is mainly used for metal or metal alloy melting in vacuum and then atomization in atomization chamber under the gas protection environment to produce metal powder or metal granule.
The vacuum type gas atomization equipment is used for production the metal powder with high control requirement of oxygen content increment, at the same time, it own all powder production functions of antivacuum gas atomization equipments.
2. Equipment capacity
30KG-1000KG/batch for choose.
3. Equipment cover area
Length*Width*Height: 6M*7M*7-12M.
Product detail pictures:



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With dependable high quality approach, great reputation and excellent customer support, the series of products and solutions produced by our firm are exported to lots of countries and regions for High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing , The product will supply to all over the world, such as: Liverpool , Luxembourg , Serbia , Meanwhile, we're building up and consummating triangle market & strategic cooperation in order to achieve a multi-win trade supply chain to expand our market vertically and horizontally for a brighter prospects. development. Our philosophy is to create cost-effective products, promote perfect services, cooperate for long-term and mutual benefits, firm a comprehensive mode of excellent suppliers system and marketing agents, brand strategic cooperation sales system.

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