High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing
High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing Detail:
1. Equipment application
This equipment is mainly used for metal or metal alloy melting in vacuum and then atomization in atomization chamber under the gas protection environment to produce metal powder or metal granule.
The vacuum type gas atomization equipment is used for production the metal powder with high control requirement of oxygen content increment, at the same time, it own all powder production functions of antivacuum gas atomization equipments.
2. Equipment capacity
30KG-1000KG/batch for choose.
3. Equipment cover area
Length*Width*Height: 6M*7M*7-12M.
Product detail pictures:
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Good quality comes 1st; assistance is foremost; business enterprise is cooperation" is our business enterprise philosophy which is regularly observed and pursued by our company for High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing , The product will supply to all over the world, such as: Chile , Durban , Bolivia , We pay high attention to customer service, and cherish every customer. We have maintained a strong reputation in the industry for many years. We are honest and work on building a long-term relationship with our customers.
After the signing of the contract, we received satisfactory goods in a short term, this is a commendable manufacturer.
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