High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing
High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing Detail:
1. Equipment application
This equipment is mainly used for metal or metal alloy melting in vacuum and then atomization in atomization chamber under the gas protection environment to produce metal powder or metal granule.
The vacuum type gas atomization equipment is used for production the metal powder with high control requirement of oxygen content increment, at the same time, it own all powder production functions of antivacuum gas atomization equipments.
2. Equipment capacity
30KG-1000KG/batch for choose.
3. Equipment cover area
Length*Width*Height: 6M*7M*7-12M.
Product detail pictures:
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Our commission is to serve our users and clients with best quality and competitive portable digital products for High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing , The product will supply to all over the world, such as: Roman , Sri Lanka , Brunei , Our company will continue to adhere to the " superior quality, reputable, the user first " principle wholeheartedly. We warmly welcome friends from all walks of life to visit and give guidance, work together and create a brilliant future!
Factory equipment is advanced in the industry and the product is fine workmanship, moreover the price is very cheap, value for money!
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