High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing
High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing Detail:
1. Equipment application
This equipment is mainly used for metal or metal alloy melting in vacuum and then atomization in atomization chamber under the gas protection environment to produce metal powder or metal granule.
The vacuum type gas atomization equipment is used for production the metal powder with high control requirement of oxygen content increment, at the same time, it own all powder production functions of antivacuum gas atomization equipments.
2. Equipment capacity
30KG-1000KG/batch for choose.
3. Equipment cover area
Length*Width*Height: 6M*7M*7-12M.
Product detail pictures:



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Adhering to your principle of "quality, assistance, performance and growth", we have now gained trusts and praises from domestic and international customer for High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing , The product will supply to all over the world, such as: Israel , Sheffield , Guatemala , During the development, our company has built a well-known brand. It is well highly acclaimed by our customers. OEM and ODM are accepted. We are looking forward to customers from all over the world to join us to a wild cooperation.

Superb technology, perfect after-sales service and efficient work efficiency, we think this is our best choice.

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